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RTP-Table-6
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product features

Infrared halogen lamp tube is heated and cooled by air cooling；
PID temperature control of lamp power can accurately control temperature rise；
Adopt parallel gas path inlet to avoid cold spots during annealing；
Three sets of process gases are standard；
Both atmospheric and vacuum treatment methods can be selected, and the gas is purified before intake.

Product description
Specification parameters
Hardware options

RTP-Table-6 is a desktop 6-inch wafer Rapid Thermal Processing. It uses upper and lower layers of infrared halogen lamps as heat sources to heat the internal quartz cavity for insulation. The cavity shell is made of water-cooled aluminum alloy, allowing the product to be heated evenly and the surface temperature is low.RTP-Table-6 adopts PID control, and the system can quickly adjust the output power of infrared halogen tubes, making the temperature control more accurate.

Working Principle

Ion implantation annealing

Rapid annealing after ITO coating

oxide

nitride growth

Silicide alloy annealing

GaAs process

Ohmic contact fast alloy

Oxidation reflux

Other semiconductor rapid heat treatment processes

Industry Application